Ingqikithi Yomkhiqizo

I-High Purity ISO Graphite yenziwe nge-Cold Isostatic Pressing (CIP) ukuze kuzuzwe ukuminyana okufanayo kwe-3D ngaphansi-kwengcindezi ephezulu (140–200 MPa). Yenziwe nge-petroleum coke ehlanzwe ngaphezu kuka-2500℃, ibonisa eduze-ukuminyana kwethiyori kanye ne-isotropy enhle kakhulu, iqinisekisa ukusebenza okuzinzile kuzo zonke izinhlelo zokusebenza ezihlukahlukene.

Imingcele Yezobuchwepheshe

Ipharamitha	Inani Eliyinhloko
Ukuminyana	1.80–1.92 g/cm³
Okuqukethwe Umlotha	Ngaphansi noma kulingana no-100 ppm
Isilinganiso se-Anisotropy	1.0–1.05
I-Coefficient of Thermal Expansion (CTE)	4.2–5.0 × 10⁻⁶/K (RT–400 degree)
Ubumsulwa	C Kukhulu noma kulingana no-99.9%
I-Thermal Conductivity	110–130 W/(m·K)
Amandla e-Flexural	55–85 MPa

Imikhiqizo isekela ukwenza ngokwezifiso komuntu siqu.

Izici ezibalulekile

Ukuhlanzeka okuphezulu{{0}okuphezulu: Ukungcola okuphansi komlotha-okuphansi kakhulu/kwensimbi (Fe, Ca, Na), ICP-kuqinisekisiwe kwe-MS, ukungcola okulingana{3}}izinkambu ezizwelayo.
Ukuminyana okuhle kakhulu: Ukuminyana kwenqwaba enkulu, i-porosity ephansi, ukukhulisa ukuqhutshwa kwe-thermal kanye nomthamo wemishini.
I-Isotropy: Umehluko omncane ekwandiseni okushisayo/amandla aguquguqukayo kuzo zonke izikhombisi-ndlela.
Ukumelana nokushisa okwedlulele: Izinzile emazingeni okushisa aphezulu endaweni epholile (ukugqoka kuyadingeka ezindaweni ezine-oxidizing ngaphezu kwamazinga okushisa athile).
Ukumelana nokushaqeka kwe-thermal: Imelana nezinguquko zezinga lokushisa ngokushesha ngaphandle kokuqhekeka.
Ukunemba kwemishini: I-ISO Graphite Ehlanzekile Ephakeme ifaka ukubekezelelana okuqinile futhi ingacutshungulwa ibe izingxenye eziyinkimbinkimbi (amadiski omoya, ama-crucibles).

Izinhlelo zokusebenza ezibalulekile

ISemiconductor: I-Monocrystalline silicon furnace thermal components/wafer carriers (izinga lokushisa eliphezulu-limelana,{1}}nokungcola okuphansi kakhulu).
I-Photovoltaic: I-Polysilicon ingot crucibles/heaters (ukumelana nokuguguleka kwe-silicon).
Amandla enuzi: -igesi ephezulu yezinga lokushisa{1}}epholile i-neutron rector (ihlangabezana nemininingwane{2}}yebanga lenuclear).
I-Aerospace: I-rocket nozzle throat inserts/ama-missile fins (ukumelana nokukhishwa{0}}kwezinga lokushisa eliphakeme ngokwedlulele).
I-metallurgy-ephezulu: Iziphambano zokuncibilika kwe-Titanium alloy (iyasebenziseka kabusha, akukho ukuvuza).
Impahla yezimboni: ama-electrode e-EDM/{0}}izingxenye eziyinhloko zesithando sokushisa esishisayo.

Isitifiketi nokwenza ngokwezifiso

I-High Purity ISO Graphite ihlangabezana nezindinganiso ze-SEMI F76 (semiconductor), ISO 8005 (nuclear), EN 10298/ASME BPVC (ukuphepha), kanye ne-RoHS 3.0 (ezemvelo). Amasevisi angokwezifiso ahlanganisa: i-silicidation (ukuthuthukisa ukumelana ne-oxidation), ukukhulelwa kwesibili (ukukhulisa ukuminyana), kanye nokuthuthukiswa{5}}kwesakhiwo esihle kakhulu (ukuthuthukisa ukuqina).